Patent Assignment Details
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| Reel/Frame: | 060724/0082 | |
| Pages: | 3 |
| | Recorded: | 08/04/2022 | | |
| Attorney Dkt #: | 108954-0196 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17881283
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Filing Dt:
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08/04/2022
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Publication #:
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Pub Dt:
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02/16/2023
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Title:
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SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT
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Assignee
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| 1-1, CHIRYO 2-CHOME, NISHIBIWAJIMA-CHO |
| KIYOSU-SHI, AICHI, JAPAN |
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Correspondence name and address
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FOLEY & LARDNER LLP
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3000 K STREET N.W.
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SUITE 600
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WASHINGTON, 20007-5109 UNITED STATES
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