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Patent Assignment Details
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Reel/Frame:013307/0140   Pages: 3
Recorded: 09/18/2002
Conveyance: ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Total properties: 3
1
Patent #:
NONE
Issue Dt:
Application #:
09791708
Filing Dt:
02/26/2001
Publication #:
Pub Dt:
09/13/2001
Title:
Chemical vapor deposition apparatus and chemical vapor deposition process
2
Patent #:
Issue Dt:
07/15/2003
Application #:
09962143
Filing Dt:
09/26/2001
Publication #:
Pub Dt:
04/11/2002
Title:
CHEMICAL VAPOR DEPOSITION APPARATUS AND CHEMICAL VAPOR DEPOSITION METHOD
3
Patent #:
Issue Dt:
12/23/2003
Application #:
10079852
Filing Dt:
02/22/2002
Publication #:
Pub Dt:
10/31/2002
Title:
CHEMICAL VAPOR DEPOSITION APPARATUS AND CHEMICAL VAPOR DEPOSITION METHOD
Assignor
1
Exec Dt:
03/29/2002
Assignee
1
8-74, KITATAMIYA 1-CHOME, TOKUSHIMA-SHI
TOKUSHIMA, JAPAN
Correspondence name and address
OBLON, SPIVAK, MCCLELLAND, MAIER, ET AL
MARVIN J. SPIVAK
FOURTH FLOOR
1755 JEFFERSON DAVIS HIGHWAY
ARLINGTON, VIRGINIA 22202

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