Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 042776/0220 | |
| Pages: | 2 |
| | Recorded: | 06/13/2017 | | |
| Attorney Dkt #: | 20374-134900 |
| Conveyance: | CHANGE OF ADDRESS |
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Total properties:
1
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Patent #:
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Issue Dt:
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10/10/2017
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Application #:
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12741854
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Filing Dt:
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06/24/2011
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Publication #:
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Pub Dt:
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10/13/2011
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Title:
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POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE
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Assignee
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| 9-2 MARUNOUCHI 1-CHOME |
| CHIYODA-KU |
| TOKYO, JAPAN 1006606 |
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Correspondence name and address
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FITCH EVEN TABIN & FLANNERY LLP
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1250 23RD STREET NW
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SUITE 410
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WASHINGTON, DC 20037
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