Patent Assignment Details
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Reel/Frame: | 009171/0238 | |
| Pages: | 2 |
| | Recorded: | 04/28/1998 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/30/2000
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Application #:
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09067970
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Filing Dt:
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04/28/1998
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Title:
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IN-SITU AND NON-INTRUSIVE METHOD FOR MONITORING PLASMA ETCH CHAMBER CONDITION UTILIZING SPECTROSCOPIC TECHNIQUE
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Assignee
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NO.2, R&D., VI, SCIENCE-BASED INDUSTRIAL PARK |
HSINCHU, TAIWAN |
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Correspondence name and address
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LAW OFFICE OF LIAUH AND ASSOCIATES
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W. WAYNE LAIUH
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4224 WAIALAE AVE., SUITE 5-388
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HONOLULU, HI 96816
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