Patent Assignment Details
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Reel/Frame: | 007613/0248 | |
| Pages: | 9 |
| | Recorded: | 07/21/1995 | | |
Conveyance: | MERGER (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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01/11/1994
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Application #:
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07928928
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Filing Dt:
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08/11/1992
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Title:
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SINGLE MASK PROCESS FOR FORMING BOTH N-TYPE AND P-TYPE GATES IN A POLYCRYSTALLINE SILICON LAYER DURING THE FORMATION OF A SEMICONDUCTOR DEVICE
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Assignee
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PATENT DEPT., MAILSTOP #525 |
8000 S. FEDERAL WAY |
BOISE, IDAHO 83706 |
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Correspondence name and address
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MICRON TECHNOLOGY, INC.
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KEVIN D. MARTIN
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PATENT DEPT., MAILSTOP #525
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8000 S. FEDERAL WAY
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BOISE, ID 83706
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