Patent Assignment Details
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| Reel/Frame: | 019813/0256 | |
| Pages: | 5 |
| | Recorded: | 09/11/2007 | | |
| Attorney Dkt #: | SEC.2081 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11853075
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Filing Dt:
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09/11/2007
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Publication #:
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Pub Dt:
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03/20/2008
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Title:
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INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION
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Assignee
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| 416, MAETAN-DONG, YEONGTONG-GU |
| SUWON-SI, GYEONGGI-DO, KOREA, REPUBLIC OF |
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Correspondence name and address
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ADAM C. VOLENTINE
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VOLENTINE & WHITT, PLLC
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11951 FREEDOM DRIVE, SUITE 1260
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RESTON, VA 20190
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