Patent Assignment Details
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Reel/Frame: | 005225/0270 | |
| Pages: | 1 |
| | Recorded: | 01/29/1990 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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07/23/1991
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Application #:
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07471848
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Filing Dt:
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01/29/1990
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Title:
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MASK FOR X-RAY LITHOGRAPHY
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Assignee
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10-1, NAKAZAWA-CHO, HAMAMATSU-SHI, |
SHIZUOKA-KEN, JAPAN |
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Correspondence name and address
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OSTROLENK, FABER, GERB & SOFFEN
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1180 AVE. OF THE AMERICAS
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NEW YORK, NY 10036-8403
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