Patent Assignment Details
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| Reel/Frame: | 011473/0274 | |
| Pages: | 3 |
| | Recorded: | 01/30/2001 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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09733601
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Filing Dt:
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12/08/2000
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Publication #:
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Pub Dt:
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06/13/2002
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Title:
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METHOD FOR FORMING SELF-ALIGNED SILICIDE BY FORMING SILICIDE ON GATE ELECTRODE PRIOR TO FORMING SILICIDE ON SOURCE/DRAIN REGIONS
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Assignee
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| SCIENCE-BASED INDUSTRIAL PARK |
| NO. 3, LI-HSIN RD. II. |
| HSINCHU, TAIWAN R.O.C |
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Correspondence name and address
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THOMAS, KAYDEN HORSTEMEYER ET AL
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DANIEL R. MCCLURE
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100 GALLERIA PARKWAY, SUITE 1750
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ATLANTA, GEORGIA 30339
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