Patent Assignment Details
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| Reel/Frame: | 012318/0279 | |
| Pages: | 3 |
| | Recorded: | 11/23/2001 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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10/01/2002
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Application #:
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09941766
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Filing Dt:
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08/30/2001
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Publication #:
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Pub Dt:
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05/09/2002
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Title:
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LOW DIELECTRIC CONSTANT FILM COMPOSED OF BORON,NITROGEN, AND HYDROGEN HAVING THERMAL RESISTANCE, PROCESS FOR FORMING THE FILM, USE OF THE FILM BETWEEN SEMICONDUCTOR DEVICE LAYERS, AND THE DEVICE FORMED FROM THE FILM
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Assignee
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| 2-3, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO 100-8310, JAPAN |
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Correspondence name and address
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OBLON, SPIVAK, MCCLELLAND, ET AL.
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NORMAN F. OBLON
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1755 JEFFERSON DAVIS HWY.
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FOURTH FLOOR
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ARLINGTON, VA 22202
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