Patent Assignment Details
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Reel/Frame: | 014833/0303 | |
| Pages: | 10 |
| | Recorded: | 12/29/2003 | | |
Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT DOCUMENT PREVIOUSLY RECORDED AT REEL 014138 FRAME 0551. |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10377293
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Filing Dt:
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02/27/2003
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Publication #:
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Pub Dt:
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09/02/2004
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Title:
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Method for formation of residue-free hardmask elements during a semiconductor device fabrication process
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Assignees
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ST. MARTIN STR. 53 |
81669 MUNICH, GERMANY |
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1-1 SHIBAURA 1-CHOME, MINATO-KU |
TOKYO 105-8001, JAPAN |
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Correspondence name and address
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LERNER, DAVID, LITTENBERG, ET AL.
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GREGORY S. GEWIRTZ
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600 SOUTH AVENUE WEST
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WESTFIELD, NJ 07090
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