Total properties:
171
Page
2
of
2
Pages:
1 2 |
|
|
|
Patent #:
|
|
Issue Dt:
|
10/09/2012
|
Application #:
|
12204959
|
Filing Dt:
|
09/05/2008
|
|
Publication #:
|
|
Pub Dt:
|
05/14/2009
| | | | |
|
Title:
|
CALIBRATION SUBSTRATE AND METHOD OF CALIBRATION THEREFOR
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/28/2013
|
Application #:
|
12251916
|
Filing Dt:
|
10/15/2008
|
|
Publication #:
|
|
Pub Dt:
|
06/04/2009
| | | | |
|
Title:
|
APPARATUS FOR THERMALLY TREATING SEMICONDUCTOR SUBSTRATES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/17/2012
|
Application #:
|
12270377
|
Filing Dt:
|
11/13/2008
|
|
Publication #:
|
|
Pub Dt:
|
04/16/2009
| | | | |
|
Title:
|
SYSTEM AND PROCESS FOR HEATING SEMICONDUCTOR WAFERS BY OPTIMIZING ABSORPTION OF ELECTROMAGNETIC ENERGY
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/07/2012
|
Application #:
|
12334425
|
Filing Dt:
|
12/12/2008
|
|
Publication #:
|
|
Pub Dt:
|
06/17/2010
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR GROWING THIN OXIDE FILMS ON SILICON WHILE MINIMIZING IMPACT ON EXISTING STRUCTURES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/18/2012
|
Application #:
|
12376231
|
Filing Dt:
|
01/08/2010
|
|
Publication #:
|
|
Pub Dt:
|
05/26/2011
| | | | |
|
Title:
|
METHOD AND APPARATUS FOR DETERMINING MEASUREMENT VALUES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/18/2015
|
Application #:
|
12395763
|
Filing Dt:
|
03/02/2009
|
|
Publication #:
|
|
Pub Dt:
|
09/03/2009
| | | | |
|
Title:
|
APPARATUS FOR THE HEAT TREATMENT OF DISC SHAPED SUBSTRATES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/21/2013
|
Application #:
|
12471375
|
Filing Dt:
|
05/23/2009
|
|
Publication #:
|
|
Pub Dt:
|
06/03/2010
| | | | |
|
Title:
|
INDUCTIVE PLASMA SOURCE WITH HIGH COUPLING EFFICIENCY
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/17/2012
|
Application #:
|
12480400
|
Filing Dt:
|
06/08/2009
|
|
Publication #:
|
|
Pub Dt:
|
10/01/2009
| | | | |
|
Title:
|
METHODS FOR DETERMINING WAFER TEMPERATURE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/20/2012
|
Application #:
|
12574441
|
Filing Dt:
|
10/06/2009
|
|
Publication #:
|
|
Pub Dt:
|
01/28/2010
| | | | |
|
Title:
|
HEATING DEVICE FOR HEATING SEMICONDUCTOR WAFERS IN THERMAL PROCESSING CHAMBERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/20/2012
|
Application #:
|
12631821
|
Filing Dt:
|
12/05/2009
|
|
Publication #:
|
|
Pub Dt:
|
04/22/2010
| | | | |
|
Title:
|
RAPID THERMAL PROCESSING USING ENERGY TRANSFER LAYERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/07/2012
|
Application #:
|
12640135
|
Filing Dt:
|
12/17/2009
|
|
Publication #:
|
|
Pub Dt:
|
04/22/2010
| | | | |
|
Title:
|
ENDEFFECTORS FOR HANDLING SEMICONDUCTOR WAFERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2013
|
Application #:
|
12696119
|
Filing Dt:
|
01/29/2010
|
|
Publication #:
|
|
Pub Dt:
|
08/05/2010
| | | | |
|
Title:
|
ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMPERATURE PROFILE ACROSS THE SURFACE OF A SUBSTRATE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/25/2017
|
Application #:
|
12776845
|
Filing Dt:
|
05/10/2010
|
|
Publication #:
|
|
Pub Dt:
|
09/02/2010
| | | | |
|
Title:
|
Selective Reflectivity Process Chamber with Customized Wavelength Response and Method
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/07/2011
|
Application #:
|
12787165
|
Filing Dt:
|
05/25/2010
|
|
Publication #:
|
|
Pub Dt:
|
09/16/2010
| | | | |
|
Title:
|
SYSTEM AND PROCESS FOR CALIBRATING PYROMETERS IN THERMAL PROCESSING CHAMBERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/26/2013
|
Application #:
|
12835589
|
Filing Dt:
|
07/13/2010
|
|
Publication #:
|
|
Pub Dt:
|
11/04/2010
| | | | |
|
Title:
|
HIGH-INTENSITY ELECTROMAGNETIC RADIATION APPARATUS AND METHODS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/30/2015
|
Application #:
|
12993077
|
Filing Dt:
|
04/01/2011
|
|
Publication #:
|
|
Pub Dt:
|
07/21/2011
| | | | |
|
Title:
|
WORKPIECE BREAKAGE PREVENTION METHOD AND APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/23/2012
|
Application #:
|
13109577
|
Filing Dt:
|
05/17/2011
|
|
Publication #:
|
|
Pub Dt:
|
09/08/2011
| | | | |
|
Title:
|
SYSTEM AND PROCESS FOR CALIBRATING PYROMETERS IN THERMAL PROCESSING CHAMBERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/16/2014
|
Application #:
|
13158634
|
Filing Dt:
|
06/13/2011
|
|
Publication #:
|
|
Pub Dt:
|
09/29/2011
| | | | |
|
Title:
|
PULSED PROCESSING SEMICONDUCTOR HEATING METHODS USING COMBINATIONS OF HEATING SOURCES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/08/2014
|
Application #:
|
13182341
|
Filing Dt:
|
07/13/2011
|
|
Publication #:
|
|
Pub Dt:
|
11/10/2011
| | | | |
|
Title:
|
IRRADIANCE PULSE HEAT-TREATING METHODS AND APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/16/2017
|
Application #:
|
13325455
|
Filing Dt:
|
12/14/2011
|
|
Publication #:
|
|
Pub Dt:
|
06/21/2012
| | | | |
|
Title:
|
INDUCTIVELY COUPLED PLASMA SOURCE FOR PLASMA PROCESSING
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/07/2014
|
Application #:
|
13356820
|
Filing Dt:
|
01/24/2012
|
|
Publication #:
|
|
Pub Dt:
|
05/24/2012
| | | | |
|
Title:
|
ENDEFFECTORS FOR HANDLING SEMICONDUCTOR WAFERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/07/2013
|
Application #:
|
13359857
|
Filing Dt:
|
01/27/2012
|
|
Publication #:
|
|
Pub Dt:
|
05/17/2012
| | | | |
|
Title:
|
METHODS AND SYSTEMS FOR SUPPORTING A WORKPIECE AND FOR HEAT-TREATING THE WORKPIECE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/15/2013
|
Application #:
|
13372082
|
Filing Dt:
|
02/13/2012
|
|
Publication #:
|
|
Pub Dt:
|
08/16/2012
| | | | |
|
Title:
|
RAPID THERMAL PROCESSING USING ENERGY TRANSFER LAYERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/15/2014
|
Application #:
|
13415963
|
Filing Dt:
|
03/09/2012
|
|
Publication #:
|
|
Pub Dt:
|
09/13/2012
| | | | |
|
Title:
|
METHOD AND SYSTEM FOR DETERMINING OPTICAL PROPERTIES OF SEMICONDUCTOR WAFERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/11/2014
|
Application #:
|
13447920
|
Filing Dt:
|
04/16/2012
|
|
Publication #:
|
|
Pub Dt:
|
08/09/2012
| | | | |
|
Title:
|
METHODS FOR DETERMINING WAFER TEMPERATURE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/11/2014
|
Application #:
|
13524931
|
Filing Dt:
|
06/15/2012
|
|
Publication #:
|
|
Pub Dt:
|
10/04/2012
| | | | |
|
Title:
|
System and Process For Heating Semiconductor Wafers by Optimizing Absorption of Electromagnetic Energy
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/23/2014
|
Application #:
|
13625161
|
Filing Dt:
|
09/24/2012
|
|
Publication #:
|
|
Pub Dt:
|
01/31/2013
| | | | |
|
Title:
|
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/08/2016
|
Application #:
|
13824269
|
Filing Dt:
|
08/01/2013
|
|
Publication #:
|
|
Pub Dt:
|
11/21/2013
| | | | |
|
Title:
|
METHODS, APPARATUS AND MEDIA FOR DETERMINING A SHAPE OF AN IRRADIANCE PULSE TO WHICH A WORKPIECE IS TO BE EXPOSED
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/12/2014
|
Application #:
|
13903258
|
Filing Dt:
|
05/28/2013
|
|
Publication #:
|
|
Pub Dt:
|
12/05/2013
| | | | |
|
Title:
|
Methods for Forming Microlenses
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/15/2016
|
Application #:
|
14173400
|
Filing Dt:
|
02/05/2014
|
|
Publication #:
|
|
Pub Dt:
|
06/05/2014
| | | | |
|
Title:
|
LOW COST HIGH THROUGHPUT PROCESSING PLATFORM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/15/2015
|
Application #:
|
14239201
|
Filing Dt:
|
02/17/2014
|
|
Publication #:
|
|
Pub Dt:
|
07/17/2014
| | | | |
|
Title:
|
High Efficiency Plasma Source
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/26/2016
|
Application #:
|
14379470
|
Filing Dt:
|
08/18/2014
|
|
Publication #:
|
|
Pub Dt:
|
02/05/2015
| | | | |
|
Title:
|
APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/01/2019
|
Application #:
|
14406256
|
Filing Dt:
|
12/08/2014
|
|
Publication #:
|
|
Pub Dt:
|
05/28/2015
| | | | |
|
Title:
|
METHOD FOR HIGH ASPECT RATIO PHOTORESIST REMOVAL IN PURE REDUCING PLASMA
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/19/2016
|
Application #:
|
14532030
|
Filing Dt:
|
11/04/2014
|
|
Publication #:
|
|
Pub Dt:
|
05/07/2015
| | | | |
|
Title:
|
Novel Mask Removal Process Strategy for Vertical NAND Device
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/29/2019
|
Application #:
|
14567631
|
Filing Dt:
|
12/11/2014
|
|
Publication #:
|
|
Pub Dt:
|
04/02/2015
| | | | |
|
Title:
|
System and Process for Calibrating Pyrometers in Thermal Processing Chambers
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/31/2018
|
Application #:
|
14581348
|
Filing Dt:
|
12/23/2014
|
|
Publication #:
|
|
Pub Dt:
|
10/22/2015
| | | | |
|
Title:
|
INDUCTIVE PLASMA SOURCE WITH HIGH COUPLING EFFICIENCY
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/02/2018
|
Application #:
|
14665684
|
Filing Dt:
|
03/23/2015
|
|
Publication #:
|
|
Pub Dt:
|
07/16/2015
| | | | |
|
Title:
|
Plasma Reactor with Inductive Excitation of Plasma and Efficient Removal of Heat from the Excitation Coil
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/14/2018
|
Application #:
|
14771525
|
Filing Dt:
|
08/31/2015
|
|
Publication #:
|
|
Pub Dt:
|
01/14/2016
| | | | |
|
Title:
|
System and Method for Protection of Vacuum Seals in Plasma Processing Systems
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/21/2019
|
Application #:
|
15073048
|
Filing Dt:
|
03/17/2016
|
|
Publication #:
|
|
Pub Dt:
|
09/22/2016
| | | | |
|
Title:
|
Controlling Azimuthal Uniformity of Etch Process in Plasma Processing Chamber
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/10/2018
|
Application #:
|
15377032
|
Filing Dt:
|
12/13/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Substrate Breakage Detection in a Thermal Processing System
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/28/2020
|
Application #:
|
15377121
|
Filing Dt:
|
12/13/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Preheat Processes for Millisecond Anneal System
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/23/2019
|
Application #:
|
15377217
|
Filing Dt:
|
12/13/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Fluid Leakage Detection for a Millisecond Anneal System
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
08/04/2020
|
Application #:
|
15378509
|
Filing Dt:
|
12/14/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
SUBSTRATE SUPPORT IN A MILLISECOND ANNEAL SYSTEM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/08/2020
|
Application #:
|
15378580
|
Filing Dt:
|
12/14/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Features for Improving Process Uniformity in a Millisecond Anneal System
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/30/2021
|
Application #:
|
15380139
|
Filing Dt:
|
12/15/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
NITROGEN INJECTION FOR ARC LAMPS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/23/2021
|
Application #:
|
15380191
|
Filing Dt:
|
12/15/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Chamber Wall Heating for a Millisecond Anneal System
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15380221
|
Filing Dt:
|
12/15/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Electrode Tip for ARC Lamp
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/22/2022
|
Application #:
|
15386538
|
Filing Dt:
|
12/21/2016
|
|
Publication #:
|
|
Pub Dt:
|
07/06/2017
| | | | |
|
Title:
|
Gas Flow Control for Millisecond Anneal System
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15403455
|
Filing Dt:
|
01/11/2017
|
|
Publication #:
|
|
Pub Dt:
|
07/20/2017
| | | | |
|
Title:
|
Variable Pattern Separation Grid for Plasma Chamber
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/16/2019
|
Application #:
|
15417470
|
Filing Dt:
|
01/27/2017
|
|
Publication #:
|
|
Pub Dt:
|
08/03/2017
| | | | |
|
Title:
|
Pre-Heat Processes for Millisecond Anneal System
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/18/2018
|
Application #:
|
15441332
|
Filing Dt:
|
02/24/2017
|
|
Publication #:
|
|
Pub Dt:
|
08/31/2017
| | | | |
|
Title:
|
IMPLANTED PHOTORESIST STRIPPING PROCESS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/03/2020
|
Application #:
|
15582896
|
Filing Dt:
|
05/01/2017
|
|
Publication #:
|
|
Pub Dt:
|
06/14/2018
| | | | |
|
Title:
|
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15589127
|
Filing Dt:
|
05/08/2017
|
|
Publication #:
|
|
Pub Dt:
|
08/24/2017
| | | | |
|
Title:
|
Inductively Coupled Plasma Source for Plasma Processing
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15591163
|
Filing Dt:
|
05/10/2017
|
|
Publication #:
|
|
Pub Dt:
|
02/22/2018
| | | | |
|
Title:
|
Separation Grid for Plasma Chamber
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/24/2020
|
Application #:
|
15597283
|
Filing Dt:
|
05/17/2017
|
|
Publication #:
|
|
Pub Dt:
|
03/15/2018
| | | | |
|
Title:
|
Strip Process for High Aspect Ratio Structure
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15650164
|
Filing Dt:
|
07/14/2017
|
|
Publication #:
|
|
Pub Dt:
|
12/28/2017
| | | | |
|
Title:
|
Inductive Plasma Source
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/03/2020
|
Application #:
|
15726437
|
Filing Dt:
|
10/06/2017
|
|
Publication #:
|
|
Pub Dt:
|
04/19/2018
| | | | |
|
Title:
|
Systems and Methods for Workpiece Processing
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/26/2019
|
Application #:
|
15843043
|
Filing Dt:
|
12/15/2017
|
|
Title:
|
Surface Treatment Of Substrates Using Passivation Layers
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/29/2020
|
Application #:
|
15851922
|
Filing Dt:
|
12/22/2017
|
|
Publication #:
|
|
Pub Dt:
|
12/13/2018
| | | | |
|
Title:
|
Plasma Processing Apparatus With Post Plasma Gas Injection
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/14/2021
|
Application #:
|
15888257
|
Filing Dt:
|
02/05/2018
|
|
Publication #:
|
|
Pub Dt:
|
12/13/2018
| | | | |
|
Title:
|
Plasma Strip Tool With Uniformity Control
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15888283
|
Filing Dt:
|
02/05/2018
|
|
Publication #:
|
|
Pub Dt:
|
12/13/2018
| | | | |
|
Title:
|
Plasma Processing Apparatus
|
|
|
|
|
Patent #:
|
NONE
|
Issue Dt:
|
|
Application #:
|
15892723
|
Filing Dt:
|
02/09/2018
|
|
Publication #:
|
|
Pub Dt:
|
12/13/2018
| | | | |
|
Title:
|
Plasma Strip Tool With Multiple Gas Injection Zones
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/05/2023
|
Application #:
|
15896124
|
Filing Dt:
|
02/14/2018
|
|
Publication #:
|
|
Pub Dt:
|
08/23/2018
| | | | |
|
Title:
|
Temperature Control Using Temperature Control Element Coupled to Faraday Shield
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/2019
|
Application #:
|
15909231
|
Filing Dt:
|
03/01/2018
|
|
Publication #:
|
|
Pub Dt:
|
07/05/2018
| | | | |
|
Title:
|
SUBSTRATE BREAKAGE DETECTION IN A THERMAL PROCESSING SYSTEM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/07/2021
|
Application #:
|
15936744
|
Filing Dt:
|
03/27/2018
|
|
Publication #:
|
|
Pub Dt:
|
10/04/2018
| | | | |
|
Title:
|
Pedestal Assembly for Plasma Processing Apparatus
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/15/2022
|
Application #:
|
15936764
|
Filing Dt:
|
03/27/2018
|
|
Publication #:
|
|
Pub Dt:
|
10/04/2018
| | | | |
|
Title:
|
Material Deposition Prevention on a Workpiece in a Process Chamber
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/01/2020
|
Application #:
|
15951291
|
Filing Dt:
|
04/12/2018
|
|
Publication #:
|
|
Pub Dt:
|
10/17/2019
| | | | |
|
Title:
|
Thermal Imaging Of Heat Sources In Thermal Processing Systems
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/16/2019
|
Application #:
|
15958560
|
Filing Dt:
|
04/20/2018
|
|
Publication #:
|
|
Pub Dt:
|
04/04/2019
| | | | |
|
Title:
|
SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING ORGANIC RADICALS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/23/2019
|
Application #:
|
15958601
|
Filing Dt:
|
04/20/2018
|
|
Publication #:
|
|
Pub Dt:
|
04/04/2019
| | | | |
|
Title:
|
SURFACE TREATMENT OF CARBON CONTAINING FILMS USING ORGANIC RADICALS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/13/2020
|
Application #:
|
15958635
|
Filing Dt:
|
04/20/2018
|
|
Publication #:
|
|
Pub Dt:
|
04/04/2019
| | | | |
|
Title:
|
SURFACE TREATMENT OF SILICON AND CARBON CONTAINING FILMS BY REMOTE PLASMA WITH ORGANIC PRECURSORS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/25/2020
|
Application #:
|
16020178
|
Filing Dt:
|
06/27/2018
|
|
Publication #:
|
|
Pub Dt:
|
12/19/2019
| | | | |
|
Title:
|
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
|
|
