Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Reel/Frame: | 006654/0392 | |
| Pages: | 2 |
| | Recorded: | 07/29/1993 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
|
Total properties:
1
|
|
Patent #:
|
|
Issue Dt:
|
01/10/1995
|
Application #:
|
08099153
|
Filing Dt:
|
07/29/1993
|
Title:
|
METHOD FOR FABRICATING PHOTOMASKS HAVING A PHASE SHIFT LAYER COMPRISING THE USE OF A POSITIVE TO NEGATIVE RESIST, SUBSTRATE IMAGING AND HEATING
|
|
Assignee
|
|
|
1-1, ICHIGAYA-KAGACHO 1-CHOME SHINJUKU-KU |
TOKYO, JAPAN 162 |
|
Correspondence name and address
|
|
DELLETT AND WALTERS
|
|
JOHN P. DELLETT
|
|
310 S.W. FOURTH AVENUE
|
|
SUITE 1101
|
|
PORTLAND, OR 97204
|
Search Results as of:
09/23/2024 01:12 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|