Patent Assignment Details
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Reel/Frame: | 006963/0407 | |
| Pages: | 3 |
| | Recorded: | 04/19/1994 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/09/1996
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Application #:
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08172167
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Filing Dt:
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12/23/1993
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Title:
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PROCESS FOR FORMING GATE SILICON OXIDE FILM FOR MOS TRANSISTORS
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Assignee
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7-35 KITASHINAGAWA 6-CHOME, SHINAGAWA-KU |
TOKYO, JAPAN |
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Correspondence name and address
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RONALD P. KANANEN
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MARKS & MURASE
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2001 L STREET, N.W.
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STE. 750
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WASHINGTON, DC 20036
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