Patent Assignment Details
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| Reel/Frame: | 053549/0424 | |
| Pages: | 14 |
| | Recorded: | 08/20/2020 | | |
| Attorney Dkt #: | 4630.3260001 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/20/2022
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Application #:
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16997616
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Filing Dt:
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08/19/2020
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Publication #:
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Pub Dt:
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09/30/2021
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Title:
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ION IMPLANT PROCESS FOR DEFECT ELIMINATION IN METAL LAYER PLANARIZATION
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Assignee
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| NO. 8, LI-HSIN RD. 6 |
| HSINCHU SCIENCE PARK |
| HSINCHU, TAIWAN 300-77 |
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Correspondence name and address
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STERNE, KESSLER, GOLDSTEIN & FOX P.L.L.C.
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1100 NEW YORK AVE., N.W.
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WASHINGTON, DC 20005
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