Patent Assignment Details
NOTE:Results display only for issued patents and published applications.
For pending or abandoned applications please consult USPTO staff.
|
Reel/Frame: | 054482/0424 | |
| Pages: | 101 |
| | Recorded: | 11/19/2020 | | |
Attorney Dkt #: | 0941-4477M |
Conveyance: | RELEASE BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). |
|
Total properties:
4
|
|
Patent #:
|
|
Issue Dt:
|
05/18/2010
|
Application #:
|
11305584
|
Filing Dt:
|
12/16/2005
|
Publication #:
|
|
Pub Dt:
|
06/21/2007
| | | | |
Title:
|
FORMATION OF RAISED SOURCE/DRAIN STRUCTURES IN NFET WITH EMBEDDED SIGE IN PFET
|
|
|
Patent #:
|
|
Issue Dt:
|
06/02/2009
|
Application #:
|
11683590
|
Filing Dt:
|
03/08/2007
|
Publication #:
|
|
Pub Dt:
|
09/11/2008
| | | | |
Title:
|
METHODS OF FORMING INTEGRATED CIRCUIT STRUCTURES USING INSULATOR DEPOSITION AND INSULATOR GAP FILLING TECHNIQUES
|
|
|
Patent #:
|
|
Issue Dt:
|
06/02/2009
|
Application #:
|
11683648
|
Filing Dt:
|
03/08/2007
|
Publication #:
|
|
Pub Dt:
|
09/11/2008
| | | | |
Title:
|
METHODS OF FORMING MASK PATTERNS ON SEMICONDUCTOR WAFERS THAT COMPENSATE FOR NONUNIFORM CENTER-TO-EDGE ETCH RATES DURING PHOTOLITHOGRAPHIC PROCESSING
|
|
|
Patent #:
|
|
Issue Dt:
|
05/03/2011
|
Application #:
|
12366356
|
Filing Dt:
|
02/05/2009
|
Publication #:
|
|
Pub Dt:
|
08/05/2010
| | | | |
Title:
|
STRESS OPTIMIZATION IN DUAL EMBEDDED EPITAXIALLY GROWN SEMICONDUCTOR PROCESSING
|
|
Assignee
|
|
|
P.O. BOX 309, UGLAND HOUSE |
GRAND CAYMAN, CAYMAN ISLANDS KY1-1104 |
|
Correspondence name and address
|
|
BIRCH, STEWART, KOLASCH & BIRCH, LLP
|
|
8110 GATEHOUSE ROAD, SUITE 100 EAST
|
|
FALLS CHURCH, VA 22042-1248
|
Search Results as of:
09/23/2024 03:02 PM
If you have any comments or questions concerning the data displayed,
contact
PRD / Assignments at 571-272-3350. v.2.6
Web interface last modified:
August 25, 2017 v.2.6
|