Patent Assignment Details
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| Reel/Frame: | 045649/0442 | |
| Pages: | 9 |
| | Recorded: | 04/26/2018 | | |
| Attorney Dkt #: | 20277-142798-US |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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02/08/2022
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Application #:
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15759076
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Filing Dt:
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03/09/2018
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Publication #:
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Pub Dt:
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02/21/2019
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Title:
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COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD
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Assignee
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| 5-2, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8324 |
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Correspondence name and address
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FITCH EVEN TABIN & FLANNERY, LLP
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120 SOUTH LASALLE STREET
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SUITE 2100
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CHICAGO, IL 60603-3406
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