Patent Assignment Details
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| Reel/Frame: | 007190/0444 | |
| Pages: | 3 |
| | Recorded: | 10/06/1994 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/14/1995
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Application #:
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08319217
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Filing Dt:
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10/06/1994
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Title:
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DOUBLE MASK PROCESS FOR FORMING TRENCHES AND CONTACTS DURING THE FORMATION OF A SEMICONDUCTOR MEMORY DEVICE
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Assignee
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| PATENT DEPT. MAIL STOP 507 |
| 2805 E. COLUMBIA RD. |
| BOISE,, IDAHO 83706 |
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Correspondence name and address
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KEVIN D. MARTIN
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MICRON SEMICONDUCTOR, INC.
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MAIL STOP 507 PATENT DEPT.
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2805 E. COLUMBIA RD.
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BOISE, ID 83706
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