|
Total properties:
18
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/30/1987
|
Application #:
|
06795549
|
Filing Dt:
|
11/01/1985
|
|
Title:
|
STEPPER FOR VLSI CIRCUIT MANUFACTURE UTILIZING RADIATION ABSORBING DYESTUFF FOR REGISTRATION OF ALIGNMENT MARKERS AND RETICLE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/20/1987
|
Application #:
|
06802514
|
Filing Dt:
|
11/27/1985
|
|
Title:
|
THERMALLY STABILIZED PHOTORESIST IMAGES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/28/1989
|
Application #:
|
07035413
|
Filing Dt:
|
04/06/1987
|
|
Title:
|
METHOD OF DEVELOPING A HIGH CONTRAST,POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING ALKANOLAMINE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/24/1990
|
Application #:
|
07227404
|
Filing Dt:
|
08/02/1988
|
|
Title:
|
HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS WITH MIXED CRESOL AND HYDROXYBENZALDEHYDE PREPARED NOVOLAK AND PHOTOSENSITIVE DIAZOQUINONE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/24/1990
|
Application #:
|
07376971
|
Filing Dt:
|
07/06/1989
|
|
Title:
|
HIGH SENSITIVITY MID AND DEEP UV RESIST
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/05/1991
|
Application #:
|
07454409
|
Filing Dt:
|
12/21/1989
|
|
Title:
|
METHOD OF FORMING A THERMALLY STABLE MIXED ALDEHYDE NOVOLAK RESIN CONTAINING RESIST PATTERN AND THAT PATTERN ON A SUBSTRATE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/26/1993
|
Application #:
|
07475402
|
Filing Dt:
|
02/05/1990
|
|
Title:
|
NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/26/1991
|
Application #:
|
07496240
|
Filing Dt:
|
03/20/1990
|
|
Title:
|
METHOD OF FORMING RESIST PATTERN AND THERMALLY STABLE AND HIGHLY RESOLVED RESIST PATTERN
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/28/1992
|
Application #:
|
07561798
|
Filing Dt:
|
08/02/1990
|
|
Title:
|
POSITIVE-WORKING PHOTORESIST COMPOSITION CONTAINING PURIFIED BROADBAND DYE AND PROCESS OF USING
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/10/1992
|
Application #:
|
07564665
|
Filing Dt:
|
08/07/1990
|
|
Title:
|
METHOD OF DEVELOPING A HIGH CONTRAST, POSITIVE PHOTORESIST USING A DEVELOPER CONTAINING A ALKANOLAMINE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/30/1992
|
Application #:
|
07587320
|
Filing Dt:
|
09/21/1990
|
|
Title:
|
HIGH CONTRAST, POSITIVE PHOTORESIST DEVELOPER CONTAINING ALKANOLAMINE
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/14/1992
|
Application #:
|
07614636
|
Filing Dt:
|
11/16/1990
|
|
Title:
|
MIXED ALDEHYDE NOVOLAK RESINS USEFUL AS HIGH CONTRAST THERMAL STABILITY POSITIVE PHOTORESISTS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/06/1993
|
Application #:
|
07739646
|
Filing Dt:
|
08/02/1991
|
|
Title:
|
POSITIVE PHOTORESIST CONTAINING DYES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/04/1993
|
Application #:
|
07886976
|
Filing Dt:
|
05/21/1992
|
|
Title:
|
HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS HAVING NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
04/27/1993
|
Application #:
|
07919357
|
Filing Dt:
|
07/23/1992
|
|
Title:
|
HEXAHYDROXYBENZOPHENONE SULFONATE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS AND POSITIVE PHOTORESISTS EMPLOYING SAME
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/15/1994
|
Application #:
|
08003206
|
Filing Dt:
|
01/12/1993
|
|
Title:
|
POSITIVE PHOTORESISTS EMPLOYING AN ISOMERIC MIXTURE OF TWO HEXAHYDROXY -BENZOPHENONE ESTERS OF DIAZONAPHTHOQUINONE SENSITIZERS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/20/1995
|
Application #:
|
08033076
|
Filing Dt:
|
03/10/1993
|
|
Title:
|
COMPOSITION AND METHOD FOR REMOVING PHOTORESIST COMPOSITION FROM SUBSTRATES SURFACES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/02/1999
|
Application #:
|
08827905
|
Filing Dt:
|
04/07/1997
|
|
Title:
|
SOYBEAN CULTIVAR 1573379
|
|
