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221
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3
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3
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16386557
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Filing Dt:
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04/17/2019
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Publication #:
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Pub Dt:
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08/08/2019
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Title:
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Controlling Azimuthal Uniformity of Etch Process in Plasma Processing Chamber
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Patent #:
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Issue Dt:
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02/21/2023
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Application #:
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16402405
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Filing Dt:
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05/03/2019
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Publication #:
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Pub Dt:
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12/19/2019
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Title:
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METHODS AND APPARATUS FOR POST EXPOSURE BAKE PROCESSING OF A WORKPIECE
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Patent #:
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Issue Dt:
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12/22/2020
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Application #:
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16403722
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Filing Dt:
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05/06/2019
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Publication #:
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Pub Dt:
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12/26/2019
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Title:
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Post Etch Defluorination Process
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Patent #:
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Issue Dt:
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11/02/2021
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Application #:
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16420542
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Filing Dt:
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05/23/2019
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Publication #:
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Pub Dt:
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12/12/2019
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Title:
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Generation of Hydrogen Reactive Species For Processing of Workpieces
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Patent #:
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Issue Dt:
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07/13/2021
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Application #:
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16444146
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Filing Dt:
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06/18/2019
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Publication #:
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Pub Dt:
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10/03/2019
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Title:
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SURFACE TREATMENT OF SILICON OR SILICON GERMANIUM SURFACES USING ORGANIC RADICALS
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16508429
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Filing Dt:
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07/11/2019
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Publication #:
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Pub Dt:
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02/27/2020
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Title:
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Systems And Methods For Thermal Processing And Temperature Measurement Of A Workpiece At Low Temperatures
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Patent #:
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Issue Dt:
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03/30/2021
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Application #:
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16522193
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Filing Dt:
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07/25/2019
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Publication #:
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Pub Dt:
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06/11/2020
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Title:
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Integration Of Materials Removal And Surface Treatment In Semiconductor Device Fabrication
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16534149
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Filing Dt:
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08/07/2019
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Publication #:
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Pub Dt:
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03/05/2020
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Title:
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Oxide Removal From Titanium Nitride Surfaces
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Patent #:
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Issue Dt:
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06/23/2020
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Application #:
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16557346
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Filing Dt:
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08/30/2019
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Title:
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SILICON OXIDE SELECTIVE DRY ETCH PROCESS
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Patent #:
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Issue Dt:
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08/31/2021
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Application #:
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16587439
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Filing Dt:
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09/30/2019
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Publication #:
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Pub Dt:
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03/26/2020
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Title:
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Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma
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Patent #:
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Issue Dt:
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11/08/2022
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Application #:
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16589270
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Filing Dt:
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10/01/2019
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Publication #:
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Pub Dt:
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04/16/2020
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Title:
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Ozone for Selective Hydrophilic Surface Treatment
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16598423
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Filing Dt:
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10/10/2019
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Publication #:
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Pub Dt:
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04/30/2020
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Title:
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Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
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Patent #:
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Issue Dt:
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03/01/2022
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Application #:
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16713281
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Filing Dt:
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12/13/2019
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Publication #:
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Pub Dt:
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06/18/2020
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Title:
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Carbon Containing Hardmask Removal Process Using Sulfur Containing Process Gas
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Patent #:
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Issue Dt:
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07/12/2022
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Application #:
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16716585
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Filing Dt:
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12/17/2019
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Publication #:
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Pub Dt:
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06/25/2020
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Title:
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SILICON MANDREL ETCH AFTER NATIVE OXIDE PUNCH-THROUGH
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Patent #:
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Issue Dt:
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08/31/2021
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Application #:
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16718356
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Filing Dt:
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12/18/2019
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Publication #:
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Pub Dt:
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06/25/2020
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Title:
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Surface Smoothing of Workpieces
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Patent #:
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NONE
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Issue Dt:
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Application #:
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16744244
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Filing Dt:
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01/16/2020
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Publication #:
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Pub Dt:
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07/30/2020
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Title:
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Post Plasma Gas Injection In A Separation Grid
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Patent #:
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Issue Dt:
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06/22/2021
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Application #:
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16744403
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Filing Dt:
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01/16/2020
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Publication #:
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Pub Dt:
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07/23/2020
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Title:
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Ozone Treatment for Selective Silicon Nitride Etch Over Silicon
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Patent #:
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Issue Dt:
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09/19/2023
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Application #:
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16798732
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Filing Dt:
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02/24/2020
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Publication #:
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Pub Dt:
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07/23/2020
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Title:
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Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
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Patent #:
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Issue Dt:
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07/11/2023
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Application #:
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16812526
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Filing Dt:
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03/09/2020
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Publication #:
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Pub Dt:
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09/17/2020
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Title:
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Thermal Processing System With Temperature Non-Uniformity Control
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Patent #:
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Issue Dt:
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01/26/2021
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Application #:
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16822747
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Filing Dt:
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03/18/2020
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Publication #:
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Pub Dt:
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07/09/2020
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Title:
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Strip Process for High Aspect Ratio Structure
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Patent #:
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Issue Dt:
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08/24/2021
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Application #:
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16893515
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Filing Dt:
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06/05/2020
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Publication #:
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Pub Dt:
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09/24/2020
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Title:
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Pre-Heat Processes for Millisecond Anneal System
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