Patent Assignment Details
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Reel/Frame: | 009517/0482 | |
| Pages: | 3 |
| | Recorded: | 10/19/1998 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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02/29/2000
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Application #:
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09124673
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Filing Dt:
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07/29/1998
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Title:
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CHEMICALLY AMPLIFIED RESIST LARGE IN TRANSPARENCY AND SENSITIVITY TO EXPOSURE LIGHT LESS THAN 248 NANOMETER WAVELENGTH AND PROCESS OF FORMING MASK
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Assignee
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7-1, SHIBA 5-CHOME, MINATO-KU |
TOKYO, JAPAN |
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Correspondence name and address
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HELFGOTT & KARAS, P.C.
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SAMSON HELFGOTT
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EMPIRE STATE BUILDING
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350 5TH AVENUE, 60TH FLOOR
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NEW YORK, NY 10118
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