Patent Assignment Details
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| Reel/Frame: | 021629/0503 | |
| Pages: | 2 |
| | Recorded: | 10/03/2008 | | |
| Attorney Dkt #: | 201917_0010_429577 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/26/2011
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Application #:
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12245128
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Filing Dt:
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10/03/2008
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Publication #:
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Pub Dt:
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04/09/2009
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Title:
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METHOD OF MANUFACTURING GAN SUBSTRATE, METHOD OF MANUFACTURING EPITAXIALWAFER, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND EPITAXIALWAFER
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Assignee
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| 5-33, KITAHAMA 4-CHOME, CHUO-KU |
| OSAKA-SHI, OSAKA, JAPAN 541-0041 |
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Correspondence name and address
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DRINKER BIDDLE & REATH (DC)
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1500 K STREET, N.W.
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SUITE 1100
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WASHINGTON, DC 20005-1209
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