Patent Assignment Details
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| Reel/Frame: | 012919/0572 | |
| Pages: | 3 |
| | Recorded: | 05/22/2002 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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10098173
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Filing Dt:
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03/15/2002
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Publication #:
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Pub Dt:
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11/28/2002
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Title:
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Substrate for forming a resist pattern, process for producing the substrate and process for forming a resist pattern of the chemical amplification type
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Assignee
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| 6-1, MARUNOUCHI 2-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 100-8 |
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Correspondence name and address
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ARMSTRONG, WESTERMAN & HATTORI, LLP
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STEPHEN G. ADRIAN
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1725 K STREET, N.W., SUITE 1000
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WASHINGTON, D.C. 20006
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Domestic representative
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ARMSTRONG, WESTERMAN & HATTORI, LLP
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SUITE 1000, 1725 K STREET
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WASHINGTON, D.C. 20006
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