Patent Assignment Details
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| Reel/Frame: | 040317/0581 | |
| Pages: | 4 |
| | Recorded: | 10/11/2016 | | |
| Attorney Dkt #: | B-8882 966364-3 |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE CLERICAL ERROR IN THE NAME OF THE ASSIGNEE PREVIOUSLY RECORDED ON REEL 039026 FRAME 0375. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. |
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Total properties:
1
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Patent #:
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Issue Dt:
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06/13/2017
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Application #:
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14998926
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Filing Dt:
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03/07/2016
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Title:
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Fabrication and design methods using selective etching and dual-material self-aligned multiple patterning processes to reduce the cut-hole patterning yield loss
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Assignee
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| SHENZHEN UNIVERSITY TOWN, XILI, NANSHAN DISTRICT |
| SHENZHEN, CHINA 518055 |
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Correspondence name and address
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LADAS & PARRY LLP
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5670 WILSHIRE BLVD. SUITE 2100
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LOS ANGELES, CA 90036
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