Patent Assignment Details
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Reel/Frame: | 011651/0647 | |
| Pages: | 6 |
| | Recorded: | 03/26/2001 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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09752395
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Filing Dt:
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12/28/2000
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Publication #:
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Pub Dt:
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08/16/2001
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Title:
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Method for producing a wafer support, used, in particular, in a high-temperature CVD reactor or in a high-temperature CVD process which involves the use of aggressive gases
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Assignee
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KACKERTSSTRASSE15-17 |
D-52072 AACHEN, GERMANY |
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Correspondence name and address
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ST. ONGE STEWARD JOHNSTON & REENS LLC
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WESLEY W. WHITMYER, JR
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986 BEDFORD STREET
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STAMFORD, CT 06905-5619
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09/25/2024 05:41 PM
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