Patent Assignment Details
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| Reel/Frame: | 011398/0655 | |
| Pages: | 2 |
| | Recorded: | 10/31/2000 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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11/25/2003
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Application #:
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09699410
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Filing Dt:
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10/31/2000
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Title:
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ACTIVE PARTICLE, PHOTOSENSITIVE RESIN COMPOSITION, AND PROCESS FOR FORMING PATTERN
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Assignee
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| 1-2, HIRANOMACHI 4-CHOME, CHUO-KU, OSAKA-SHI |
| 541-0046, JAPAN |
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Correspondence name and address
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PILLSBURY, MADISON & SUTRO LLP
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KENDREW H. COLTON
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1100 NEW YORK AVENUE, NW
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INTELLECTUAL PROPERTY GROUP, NINTH FLOOR
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WASHINGTON, DC 20005-3918
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