Patent Assignment Details
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| Reel/Frame: | 059305/0690 | |
| Pages: | 12 |
| | Recorded: | 03/02/2022 | | |
| Attorney Dkt #: | 095714-0573 |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE TYPOGRAPHICAL ERROR IN THE SPELLING OF THE FIFTH INVENTOR'S NAME PREVIOUSLY RECORDED AT REEL: 048492 FRAME: 0443. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. |
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Total properties:
1
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Patent #:
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Issue Dt:
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04/05/2022
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Application #:
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16287450
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Filing Dt:
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02/27/2019
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Publication #:
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Pub Dt:
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01/02/2020
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Title:
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PATTERN FORMATION METHOD USING A PHOTO MASK FOR MANUFACTURING A SEMICONDUCTOR DEVICE
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Assignee
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| NO.8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN 300 |
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Correspondence name and address
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MCDERMOTT WILL & EMERY LLP
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THE MCDERMOTT BUILDING
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500 NORTH CAPITOL STREET NW
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WASHINGTON, DC 20001
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