Patent Assignment Details
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| Reel/Frame: | 019184/0695 | |
| Pages: | 9 |
| | Recorded: | 04/18/2007 | | |
| Attorney Dkt #: | JCLA22783 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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11736904
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Filing Dt:
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04/18/2007
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Publication #:
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Pub Dt:
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10/23/2008
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Title:
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METHOD OF REMOVING PHOTORESIST LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
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Assignee
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| NO. 3, LI-HSIN RD. II, SCIENCE-BASED INDUSTRIAL PARK |
| HSINCHU, TAIWAN R.O.C. |
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Correspondence name and address
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J.C. PATENTS
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4 VENTURE, SUITE 250
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IRVINE, CA 92618
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