Patent Assignment Details
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| Reel/Frame: | 027858/0787 | |
| Pages: | 7 |
| | Recorded: | 03/14/2012 | | |
| Attorney Dkt #: | PB20110463 |
| Conveyance: | CORRECTIVE ASSIGNMENT TO CORRECT THE LAST NAME OF THE 3RD ASSIGNOR PREVIOUSLY RECORDED ON REEL 027814 FRAME 0276. ASSIGNOR(S) HEREBY CONFIRMS THE LAST NAME OF THE 3RD ASSIGNOR SHOULD BE LIN INSTEAD OF LIU. |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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13413229
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Filing Dt:
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03/06/2012
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Publication #:
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Pub Dt:
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06/06/2013
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Title:
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METHOD AND MECHANISM OF PHOTORESIST LAYER STRUCTURE USED IN MANUFACTURING NANO SCALE PATTERNS
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Assignee
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| NO. 20, R&D RD., VI, HSINCHU SCIENCE PARK, |
| HSINCHU 30076,, TAIWAN |
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Correspondence name and address
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HDLS IPR SERVICES
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PO BOX 220746
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CHANTILLY, VA 20153
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