Patent Assignment Details
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Reel/Frame: | 013433/0797 | |
| Pages: | 3 |
| | Recorded: | 10/29/2002 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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03/04/2008
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Application #:
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10282111
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Filing Dt:
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10/29/2002
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Publication #:
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Pub Dt:
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07/31/2003
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Title:
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RESIST PATTERN THICKNESS REDUCING MATERIAL, RESIST PATTERN AND PROCESS FOR FORMING THEREOF, AND SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING THEREOF
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Assignee
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1-1 KAMIKODANAKA 4-CHOME, NAKAHARA-KU |
KAWASAKI-SHI |
KANAGAWA, JAPAN 211-8588 |
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Correspondence name and address
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ARMSTRONG, WESTERMAN, HATTORI, ET AL.
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STEPHEN G. ADRIAN
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1725 K STREET
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SUITE 1000
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WASHINGTON, DC 20006
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