Patent Assignment Details
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For pending or abandoned applications please consult USPTO staff.
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| Reel/Frame: | 043123/0819 | |
| Pages: | 8 |
| | Recorded: | 07/28/2017 | | |
| Attorney Dkt #: | 17-954 |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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NONE
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Issue Dt:
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Application #:
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15634241
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Filing Dt:
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06/27/2017
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Publication #:
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Pub Dt:
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12/27/2018
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Title:
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Low Temperature Process for Forming Silicon-Containing Thin Layer
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Assignee
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| 112, GWAHAKSANEOP 3-RO, OCHANG-EUP |
| CHEONGWON-GUN, CHEONGJU-SI |
| CHUNGCHEONGBUK-DO, KOREA, REPUBLIC OF 28125 |
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Correspondence name and address
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LISA M.W. HILLMAN, PH.D.
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300 SOUTH WACKER DRIVE
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CHICAGO, IL 60606
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