Patent Assignment Details
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Reel/Frame: | 005873/0846 | |
| Pages: | 4 |
| | Recorded: | 10/07/1991 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/07/1993
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Application #:
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07740759
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Filing Dt:
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08/05/1991
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Title:
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PULSED GAS PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON
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Correspondence name and address
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IBM CORPORATION
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INTELLECTUAL PROPERTY LAW DEPT.
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P.O. BOX 218
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YORKTOWN HEIGHTS, NY 10598
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