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Total properties:
15
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Patent #:
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Issue Dt:
|
03/27/2001
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Application #:
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09350417
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Filing Dt:
|
07/08/1999
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Title:
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METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES
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Patent #:
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Issue Dt:
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01/07/2003
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Application #:
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09470279
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Filing Dt:
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12/22/1999
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Title:
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APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
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|
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Patent #:
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Issue Dt:
|
09/17/2002
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Application #:
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09727978
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Filing Dt:
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11/29/2000
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Publication #:
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Pub Dt:
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05/10/2001
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Title:
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APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION
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Patent #:
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Issue Dt:
|
02/27/2007
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Application #:
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10122643
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Filing Dt:
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04/12/2002
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Title:
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METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE FILMS BY ATOMIC LAYER DEPOSITION
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|
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Patent #:
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Issue Dt:
|
06/14/2005
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Application #:
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10175556
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Filing Dt:
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06/17/2002
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Title:
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METHOD AND APPARATUS FOR FLEXIBLE ATOMIC LAYER DEPOSITION
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Patent #:
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Issue Dt:
|
04/01/2003
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Application #:
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10186071
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Filing Dt:
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06/28/2002
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Publication #:
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Pub Dt:
|
11/07/2002
| | | | |
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Title:
|
APPARATUS AND CONCEPT FOR MINIMIZING PARASITIC CHEMICAL VAPOR DEPOSITION DURING ATOMIC LAYER DEPOSITION
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|
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Patent #:
|
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Issue Dt:
|
10/28/2003
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Application #:
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10256899
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Filing Dt:
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09/27/2002
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Publication #:
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Pub Dt:
|
02/06/2003
| | | | |
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Title:
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APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
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|
|
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Patent #:
|
|
Issue Dt:
|
06/07/2005
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Application #:
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10282609
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Filing Dt:
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10/29/2002
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Publication #:
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|
Pub Dt:
|
06/12/2003
| | | | |
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Title:
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MASSIVELY PARALLEL ATOMIC LAYER DEPOSITION/CHEMICAL VAPOR DEPOSITION SYSTEM
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|
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Patent #:
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Issue Dt:
|
03/08/2005
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Application #:
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10295614
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Filing Dt:
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11/14/2002
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Publication #:
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Pub Dt:
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05/20/2004
| | | | |
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Title:
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METHOD AND APPARATUS FOR PROVIDING AND INTEGRATING A GENERAL METAL DELIVERY SOURCE (GMDS) WITH ATOMIC LAYER DEPOSITION (ALD)
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Patent #:
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Issue Dt:
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03/28/2006
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Application #:
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10655682
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Filing Dt:
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09/04/2003
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Publication #:
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Pub Dt:
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07/01/2004
| | | | |
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Title:
|
METHOD AND APPARATUS FOR PROVIDING UNIFORM GAS DELIVERY TO SUBSTRATES IN CVD AND PECVD PROCESSES
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|
|
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Patent #:
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|
Issue Dt:
|
05/24/2005
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Application #:
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10666694
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Filing Dt:
|
09/18/2003
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|
Title:
|
APPARATUS AND METHOD TO ACHIEVE CONTINUOUS INTERFACE AND ULTRATHIN FILM DURING ATOMIC LAYER DEPOSITION
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|
|
|
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Patent #:
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|
Issue Dt:
|
03/21/2006
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Application #:
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10777349
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Filing Dt:
|
02/11/2004
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|
Publication #:
|
|
Pub Dt:
|
10/28/2004
| | | | |
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Title:
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PURGED HEATER-SUSCEPTOR FOR AN ALD/CVD REACTOR
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Patent #:
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|
Issue Dt:
|
07/19/2011
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Application #:
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10791334
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Filing Dt:
|
03/01/2004
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Publication #:
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Pub Dt:
|
06/05/2008
| | | | |
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Title:
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TRANSIENT ENHANCED ATOMIC LAYER DEPOSITION
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|
|
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Patent #:
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|
Issue Dt:
|
01/16/2007
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Application #:
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11216750
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Filing Dt:
|
08/30/2005
|
|
Title:
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METHODS AND PROCEDURES FOR ENGINEERING OF COMPOSITE CONDUCTIVE BY ATOMIC LAYER DEPOSITION
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|
|
|
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Patent #:
|
|
Issue Dt:
|
12/09/2014
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Application #:
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14038669
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Filing Dt:
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09/26/2013
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Publication #:
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Pub Dt:
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01/30/2014
| | | | |
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Title:
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APPARATUS AND METHOD FOR HIGH-THROUGHPUT CHEMICAL VAPOR DEPOSITION
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