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Total properties:
52
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Patent #:
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NONE
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Issue Dt:
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Application #:
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17392435
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Filing Dt:
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08/03/2021
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Publication #:
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Pub Dt:
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11/25/2021
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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|
Patent #:
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NONE
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Issue Dt:
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Application #:
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17669577
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Filing Dt:
|
02/11/2022
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Publication #:
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Pub Dt:
|
09/08/2022
| | | | |
|
Title:
|
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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|
Patent #:
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NONE
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Issue Dt:
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Application #:
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17677173
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Filing Dt:
|
02/22/2022
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Publication #:
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Pub Dt:
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09/22/2022
| | | | |
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Title:
|
RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
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|
Patent #:
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NONE
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Issue Dt:
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Application #:
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17679262
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Filing Dt:
|
02/24/2022
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Publication #:
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Pub Dt:
|
06/09/2022
| | | | |
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Title:
|
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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|
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|
Patent #:
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NONE
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Issue Dt:
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Application #:
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17795967
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Filing Dt:
|
07/28/2022
|
|
Publication #:
|
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Pub Dt:
|
04/06/2023
| | | | |
|
Title:
|
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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|
Patent #:
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Issue Dt:
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07/29/2025
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Application #:
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17798128
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Filing Dt:
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08/08/2022
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Publication #:
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Pub Dt:
|
04/06/2023
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Title:
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METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COMPOSITION
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Patent #:
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04/01/2025
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Application #:
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17854012
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Filing Dt:
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06/30/2022
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Publication #:
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Pub Dt:
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10/27/2022
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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NONE
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17974618
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10/27/2022
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03/23/2023
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Title:
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SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
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NONE
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Application #:
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17994515
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11/28/2022
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Publication #:
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Pub Dt:
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04/06/2023
| | | | |
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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Patent #:
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NONE
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Issue Dt:
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Application #:
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18023760
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02/28/2023
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10/26/2023
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Title:
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PREPREG, METAL-CLAD LAMINATE, AND PRINTED WIRING BOARD
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NONE
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18024309
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03/02/2023
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Pub Dt:
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08/31/2023
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
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Patent #:
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NONE
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Application #:
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18025989
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Filing Dt:
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03/13/2023
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Publication #:
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Pub Dt:
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01/04/2024
| | | | |
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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Patent #:
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NONE
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Application #:
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18026002
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07/15/2024
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Publication #:
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Pub Dt:
|
11/21/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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Patent #:
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NONE
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18108108
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02/10/2023
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06/29/2023
| | | | |
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Title:
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COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
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Patent #:
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05/27/2025
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18127066
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03/28/2023
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08/03/2023
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Title:
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METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AND COMPOSITION
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NONE
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18135838
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04/18/2023
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11/30/2023
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND
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NONE
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18138873
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04/25/2023
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Pub Dt:
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08/17/2023
| | | | |
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Title:
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COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS
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Patent #:
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NONE
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18197225
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05/15/2023
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Pub Dt:
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09/07/2023
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND
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NONE
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18198954
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05/18/2023
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Publication #:
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Pub Dt:
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10/26/2023
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Title:
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SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
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Patent #:
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NONE
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Issue Dt:
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Application #:
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18198971
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Filing Dt:
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05/18/2023
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Publication #:
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Pub Dt:
|
12/14/2023
| | | | |
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND
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NONE
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18209751
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06/14/2023
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Pub Dt:
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10/26/2023
| | | | |
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
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NONE
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18215863
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06/29/2023
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Pub Dt:
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10/26/2023
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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NONE
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18218193
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07/05/2023
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01/04/2024
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Title:
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COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
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NONE
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18235420
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Filing Dt:
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08/18/2023
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Pub Dt:
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12/07/2023
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND
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NONE
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18239373
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08/29/2023
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12/28/2023
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Title:
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COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
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NONE
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18244460
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09/11/2023
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Pub Dt:
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12/28/2023
| | | | |
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Title:
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COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
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Patent #:
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NONE
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18277113
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08/14/2023
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Pub Dt:
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05/09/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
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Patent #:
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NONE
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18372163
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09/25/2023
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01/18/2024
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
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Patent #:
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NONE
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18374041
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09/28/2023
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01/25/2024
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
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Patent #:
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NONE
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18391906
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12/21/2023
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05/09/2024
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
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Patent #:
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NONE
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18422098
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01/25/2024
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06/06/2024
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Title:
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COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
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NONE
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18435001
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02/07/2024
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08/01/2024
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
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NONE
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18440124
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02/13/2024
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Pub Dt:
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07/11/2024
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Title:
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METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM
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NONE
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18509611
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11/15/2023
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Pub Dt:
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03/28/2024
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Title:
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SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
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Patent #:
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NONE
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18528951
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Filing Dt:
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12/05/2023
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Publication #:
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Pub Dt:
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05/02/2024
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Title:
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SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
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Patent #:
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NONE
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18632646
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04/11/2024
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Pub Dt:
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08/22/2024
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Title:
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COMPOSITION, METAL-CONTAINING FILM, METAL-CONTAINING FILM FORMATION METHOD, AND COMPOSITION PRODUCTION METHOD
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NONE
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18636755
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04/16/2024
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Pub Dt:
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08/29/2024
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Title:
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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
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Patent #:
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NONE
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18678331
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Filing Dt:
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05/30/2024
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Pub Dt:
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09/26/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING SUBSTRATE, AND COMPOUND
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NONE
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18685539
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02/22/2024
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Pub Dt:
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11/07/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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NONE
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18691090
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03/12/2024
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Pub Dt:
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11/21/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN FORMATION METHOD
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NONE
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18699377
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04/08/2024
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12/12/2024
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Title:
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PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
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NONE
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18769554
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07/11/2024
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Pub Dt:
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11/07/2024
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Title:
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METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR FORMING RESIST UNDERLAYER FILM, AND CLEANING LIQUID
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NONE
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18795534
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08/06/2024
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11/28/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
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NONE
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18796665
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08/07/2024
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11/28/2024
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
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Patent #:
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NONE
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18848176
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09/18/2024
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07/24/2025
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RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
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NONE
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18910163
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10/09/2024
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04/03/2025
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SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM FORMING COMPOSITION
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NONE
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18919818
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10/18/2024
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02/06/2025
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METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING COMPOSITION
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NONE
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18951794
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11/19/2024
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03/06/2025
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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NONE
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18951824
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11/19/2024
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05/22/2025
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Title:
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RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
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NONE
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18951861
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11/19/2024
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Pub Dt:
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03/06/2025
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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NONE
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18952057
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11/19/2024
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03/06/2025
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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NONE
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18953228
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11/20/2024
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Pub Dt:
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03/13/2025
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Title:
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
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