Patent Assignment Details
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Reel/Frame: | 005603/0890 | |
| Pages: | 3 |
| | Recorded: | 02/07/1991 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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01/31/1995
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Application #:
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07652339
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Filing Dt:
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02/07/1991
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Title:
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METHOD OF FORMING A DOPED REGION IN A SEMICONDUCTOR SUBSTRATE UTILIZING A SACRIFICIAL EPITAXIAL SILICON LAYER
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Correspondence name and address
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JEFFREY L. BRANDT
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IBM CORP., DEPT 18G/BLDG 300-482
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ROUTE 52
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HOPEWELL JUNCTION, NY 12533-9988
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