Total properties:
123
Page
2
of
2
Pages:
1 2
|
|
Patent #:
|
|
Issue Dt:
|
11/10/1992
|
Application #:
|
07776598
|
Filing Dt:
|
10/11/1991
|
Title:
|
ION SOURCE
|
|
|
Patent #:
|
|
Issue Dt:
|
04/20/1993
|
Application #:
|
07779444
|
Filing Dt:
|
10/18/1991
|
Title:
|
NARROW SPECTRAL BAND PYROMETRY
|
|
|
Patent #:
|
|
Issue Dt:
|
12/27/1994
|
Application #:
|
07818662
|
Filing Dt:
|
01/09/1992
|
Title:
|
PLASMA ETCH PROCESS AND EQUIPMENT
|
|
|
Patent #:
|
|
Issue Dt:
|
04/05/1994
|
Application #:
|
07877452
|
Filing Dt:
|
05/01/1992
|
Title:
|
ION ACCELERATOR
|
|
|
Patent #:
|
|
Issue Dt:
|
06/07/1994
|
Application #:
|
07958077
|
Filing Dt:
|
10/07/1992
|
Title:
|
METHOD OF MONITORING ION BEAM CURRENT IN ION IMPLANTATION APPARATUS FOR USE IN MANUFACTURING SEMICONDUCTORS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/06/1994
|
Application #:
|
07964381
|
Filing Dt:
|
10/21/1992
|
Title:
|
SPIRAL SCAN COMPUTER TOMOGRAPHY APPARATUS
|
|
|
Patent #:
|
|
Issue Dt:
|
04/26/1994
|
Application #:
|
08033286
|
Filing Dt:
|
03/16/1993
|
Title:
|
PRODUCTION OF HIGH BEAM CURRENTS AT LOW ENERGIES FOR USE IN ION IMPLANTATION SYSTEMS
|
|
|
Patent #:
|
|
Issue Dt:
|
11/05/1996
|
Application #:
|
08059033
|
Filing Dt:
|
05/07/1993
|
Title:
|
CHARGE MONITOR FOR HIGH POTENTIAL PULSE CURRENT DOSE MEASUREMENT APPARATUS AND METHOD
|
|
|
Patent #:
|
|
Issue Dt:
|
09/27/1994
|
Application #:
|
08076509
|
Filing Dt:
|
06/14/1993
|
Title:
|
WAFER RETAINING PLATEN HAVING PERIPHERAL CLAMP AND WAFER LIFTING MEANS
|
|
|
Patent #:
|
|
Issue Dt:
|
01/23/1996
|
Application #:
|
08125117
|
Filing Dt:
|
09/21/1993
|
Title:
|
SCAN TECHNIQUE TO REDUCE TRANSIENT WAFER TEMPERATURES DURING ION IMPLANTATION
|
|
|
Patent #:
|
|
Issue Dt:
|
06/20/1995
|
Application #:
|
08213459
|
Filing Dt:
|
03/14/1994
|
Title:
|
ANTI-STICK ELECTROSTATIC CHUCK FOR A LOW PRESSURE ENVIRONMENT
|
|
|
Patent #:
|
|
Issue Dt:
|
12/24/1996
|
Application #:
|
08304719
|
Filing Dt:
|
09/12/1994
|
Title:
|
PLASMA ETCH EQUIPMENT
|
|
|
Patent #:
|
|
Issue Dt:
|
03/26/1996
|
Application #:
|
08343116
|
Filing Dt:
|
11/22/1994
|
Title:
|
METHOD OF CONSTRUCTING CMOS VERTICALLY MODULATED WELLS (VMW) BY CLUSTERED MEV BILLI (BURIED IMPLANTED LAYER FOR LATERAL ISOLATION) IMPLANTATION
|
|
|
Patent #:
|
|
Issue Dt:
|
09/19/1995
|
Application #:
|
08383554
|
Filing Dt:
|
01/31/1995
|
Title:
|
ELECTROSTATIC WAFER CLAMP
|
|
|
Patent #:
|
|
Issue Dt:
|
01/27/1998
|
Application #:
|
08469401
|
Filing Dt:
|
06/06/1995
|
Title:
|
APPARATUS FOR OBTAINING DOSE UNIFORMITY IN PLASMA DOPING (PLAD) ION IMPLANTATION PROCESSES
|
|
|
Patent #:
|
|
Issue Dt:
|
04/21/1998
|
Application #:
|
08474027
|
Filing Dt:
|
06/07/1995
|
Title:
|
OPTICAL POSITION CALIBRATION SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
05/13/1997
|
Application #:
|
08585626
|
Filing Dt:
|
01/16/1996
|
Title:
|
CHARGED PARTICLE BEAM SYSTEM HAVING BEAM-DEFINING SLIT FORMED BY ROTATING CYCLINDERS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/29/1998
|
Application #:
|
08617293
|
Filing Dt:
|
03/18/1996
|
Title:
|
SEMICONDUCTOR DEVICE HAVING AT LEAST ONE FIELD OXIDE AREA AND CMOS VERTICALLY MODULATED WELLS (VMW) WITH A BURIED IMPLANTED LAYER FOR LATERAL ISOLATION
|
|
|
Patent #:
|
|
Issue Dt:
|
11/25/1997
|
Application #:
|
08728421
|
Filing Dt:
|
10/10/1996
|
Title:
|
WAFER ORIENTATION ALIGNMENT SYSTEM
|
|
|
Patent #:
|
|
Issue Dt:
|
05/26/1998
|
Application #:
|
08763250
|
Filing Dt:
|
12/10/1996
|
Title:
|
ZERO DEFLECTION MAGNETICALLY-SUPPRESSED FARADAY FOR ION IMPLANTERS
|
|
|
Patent #:
|
|
Issue Dt:
|
10/13/1998
|
Application #:
|
08779899
|
Filing Dt:
|
01/07/1997
|
Title:
|
APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF WORKPIECES IN VACUUM
|
|
|
Patent #:
|
|
Issue Dt:
|
10/13/1998
|
Application #:
|
08822537
|
Filing Dt:
|
03/19/1997
|
Title:
|
METHOD FOR CMOS LATCH-UP IMPROVEMENT BY MEV BILLI (BURIED IMPLANTED LAYER FOR LATERAL ISOLATION) PLUS BURIED LAYER IMPLANTATION
|
|
|
Patent #:
|
|
Issue Dt:
|
11/17/1998
|
Application #:
|
08822543
|
Filing Dt:
|
03/19/1997
|
Title:
|
CHARGE EXCHANGE CELL
|
|