Patent Assignment Details
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Reel/Frame: | 008131/0960 | |
| Pages: | 2 |
| | Recorded: | 08/19/1996 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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03/10/1998
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Application #:
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08622692
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Filing Dt:
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03/26/1996
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Title:
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SILICON-RICH TUNNEL OXIDE FORMED BY OXYGEN IMPLANTATION FOR FLASH EEPROM
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Assignee
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NO. 13, INNOVATION RD. I., SCIENCE-BASED INDUSTRIAL PARK |
HSIN-CHU CITY, REPUBLIC OF CHINA, TAIWAN |
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Correspondence name and address
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MELTZER, LIPPE, GOLDSTEIN, WOLF ET AL
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JOSEPH B. RYAN
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190 WILLIS AVENUE
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MINEOLA, NY 11501
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