Patent Assignment Details
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| Reel/Frame: | 012707/0971 | |
| Pages: | 4 |
| | Recorded: | 03/14/2002 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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05/22/2001
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Application #:
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09425904
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Filing Dt:
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10/25/1999
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Title:
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METHOD TO FORM GATE OXIDES OF DIFFERENT THICKNESSES ON A SILICON SUBSTRATE
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Assignees
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| 60 WOODLANDS INDUSTRIAL PARK D. STREET 2 |
| SINGAPORE, SINGAPORE 73840 |
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| SCIENCE PARK ROAD |
| SINGAPORE SCIENCE PARK II |
| SINGAPORE 117685, SINGAPORE |
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Correspondence name and address
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GEORGE O. SAILE
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20 MCINTOSH DRIVE
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POUGHKEEPSIE, NY 12503
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