Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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08/06/2019
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Application #:
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15533237
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Filing Dt:
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06/05/2017
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Publication #:
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Pub Dt:
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11/09/2017
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Inventors:
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Wataru SHIBAYAMA, Kenji TAKASE, Rikimaru SAKAMOTO
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Title:
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RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING HYDROLYZABLE SILANE HAVING HALOGEN-CONTAINING CARBOXYLIC ACID AMIDE GROUP
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 7-1, KANDA NISHIKI-CHO 3-CHOME, CHIYODA-KU |
| TOKYO, JAPAN 101-0054 |
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| JAMES A. OLIFF |
| OLIFF PLC |
| P.O. BOX 320850 |
| ALEXANDRIA, VA 22320-4850 |
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