Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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08/27/2019
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Application #:
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15615254
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Filing Dt:
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06/06/2017
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Publication #:
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Pub Dt:
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12/06/2018
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Inventors:
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Jonathan G. Weis, Nan-Rong Chiou, George C. Jacob, Bainian Qian
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Title:
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CHEMICAL MECHANICAL POLISHING PADS FOR IMPROVED REMOVAL RATE AND PLANARIZATION
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 451 BELLEVUE ROAD |
| NEWARK, DELAWARE 19713 |
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| 2040 DOW CENTER |
| MIDLAND, MICHIGAN 48674 |
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| PATRICIA CONNELL |
| 451 BELLEVUE ROAD |
| NEWARK, DE 19713 |
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