Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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03/03/2020
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Application #:
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16152784
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Filing Dt:
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10/05/2018
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Publication #:
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Pub Dt:
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04/11/2019
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Inventors:
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Thomas Thaler, Kujan Gorhad, Ute Buttgereit, Yuval Perets, Joachim Welte et al
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Title:
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Method for Correcting the Critical Dimension Uniformity of a Photomask for Semiconductor Lithography
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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RUDOLF-EBER-STRASSE 2 |
OBERKOCHEN, GERMANY 73447 |
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REX I. HUANG |
FISH & RICHARDSON P.C. |
P.O.BOX 1022 |
MINNEAPOLIS, MN 55440-1022 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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HADOLEY 3 |
BAR LEV INDUSTRIAL PARK |
D.N. MISGAV, ISRAEL 2015600 |
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REX I. HUANG |
FISH & RICHARDSON P.C. |
P.O.BOX 1022 |
MINNEAPOLIS, MN 55440-1022 |
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09/26/2024 04:42 PM
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