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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
05/17/2022
Application #:
15902858
Filing Dt:
02/22/2018
Publication #:
Pub Dt:
08/23/2018
Inventors:
Angelique D. Raley, Eric Chih-Fang Liu, Nihar Mohanty
Title:
Method For Reducing Lithography Defects and Pattern Transfer
Assignment: 1
Reel/Frame:
059557/0052Recorded: 04/11/2022Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
04/07/2022
Exec Dt:
04/07/2022
Exec Dt:
03/01/2018
Assignee:
ALASKA BIZ TOWER
3-1 AKASAKA 5-CHOME
MINATO-KU, TOKYO, JAPAN 107-6325
Correspondent:
WOOD, HERRON & EVANS, LLP (TOKYO ELECTRO
2700 CAREW TOWER
441 VINE STREET
CINCINNATI, OH 45202

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