Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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08/15/2023
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Application #:
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16633997
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Filing Dt:
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01/24/2020
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Publication #:
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Pub Dt:
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06/25/2020
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Inventors:
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Minho Jung, Namkyu Lee, Jinsu Ham, Kyunphyo Lee, Kwangkuk Lee, Kwangho Lee, Hyeryoung Lee et al
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Title:
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Polymer For Formation of Resist Underlayer Film, Composition for Formation of Resist Underlayer Film Comprising Same and Method for Manufacturing Semiconductor Element by Using Same
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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26, JONG-RO, JONGNO-GU |
SEOUL, KOREA, REPUBLIC OF 03188 |
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26, JONG-RO, JONGNO-GU |
SEOUL, KOREA, REPUBLIC OF 03188 |
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THE WEBB LAW FIRM |
420 FT. DUQUESNE BLVD |
ONE GATEWAY CENTER, SUITE 1200 |
PITTSBURGH, PA 15222 |
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Assignment:
2
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CHANGE OF NAME (SEE DOCUMENT FOR DETAILS).
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26, JONG-RO, JONGNO-GU |
SEOUL, KOREA, REPUBLIC OF |
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CPA GLOBAL LIMITED |
LIBERATION HOUSE |
CASTLE STREET |
ST HELIER, JE1 1BL JERSEY |
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09/22/2024 08:48 AM
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