Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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08/15/2023
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Application #:
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17712419
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Filing Dt:
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04/04/2022
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Publication #:
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Pub Dt:
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07/14/2022
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Inventors:
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Kai-Hsiung Chen, Hung-Chih Hsieh, Po-Chung Cheng
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Title:
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OVERLAY MARKS FOR REDUCING EFFECT OF BOTTOM LAYER ASYMMETRY
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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8, LI-HSIN RD. 6 |
HSINCHU SCIENCE PARK |
HSINCHU, TAIWAN 300-78 |
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HAYNES AND BOONE, LLP |
2323 VICTORY AVENUE |
SUITE 700 |
DALLAS, TX 75219 |
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09/23/2024 07:36 PM
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