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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
11/14/2023
Application #:
17144416
Filing Dt:
01/08/2021
Publication #:
Pub Dt:
07/08/2021
Inventors:
Cheol SHIN, Jong-Hwa LEE, Chul-Kyu YANG, Gil-Woo KONG
Title:
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
Assignment: 1
Reel/Frame:
054858/0207Recorded: 01/08/2021Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
01/08/2021
Exec Dt:
01/08/2021
Exec Dt:
01/08/2021
Exec Dt:
01/08/2021
Assignee:
42, HOSAN-DONGRO
DALSEO-GU
DAEGU-SI, KOREA, REPUBLIC OF 42714
Correspondent:
JUAN CARLOS A. MARQUEZ
MARQUEZ INTELLECTUAL PROPERTY OFFICE
1629 K STREET, NEW, SUITE 300
WASHINGTON, DC 20006

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