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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
09/17/2024
Application #:
17508191
Filing Dt:
10/22/2021
Publication #:
Pub Dt:
02/10/2022
Inventors:
Kazuya Kiriyama, Katsuaki Nishikori, Takuhiro Taniguchi, Ryuichi Nemoto, Ken Maruyama
Title:
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND
Assignment: 1
Reel/Frame:
057877/0310Recorded: 10/22/2021Pages: 8
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
10/07/2021
Exec Dt:
10/07/2021
Exec Dt:
10/08/2021
Exec Dt:
10/08/2021
Exec Dt:
10/07/2021
Assignee:
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU
TOKYO, JAPAN 105-8640
Correspondent:
ELEMENT IP, PLC
2331 MILL ROAD
SUITE 610
ALEXANDRIA, VA 22314

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