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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
11/29/1988
Application #:
06931495
Filing Dt:
11/17/1986
Inventors:
DAVID B. BAILEY, MICHAEL M. FELDMAN
Title:
PHOTORESIST COMPOSITION COMPRISING AN INTERPOLYMER OF A SILICON- CONTAINING MONOMER AND AN HYDROXYSTYRENE
Assignment: 1
Reel/Frame:
004942/0046Recorded: 09/01/1988Pages: 2
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST.
Assignors:
Exec Dt:
11/10/1986
Exec Dt:
11/12/1986
Assignee:
ROCHESTER, NEW YORK 14650
Correspondent:
ARMIN B. PAGEL
EASTMAN KODAK CO, PAT. DEPT.
343 STATE ST.
ROCHESTER, NY 14650

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