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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
10/01/1991
Application #:
07555278
Filing Dt:
07/19/1990
Inventor:
ANGUS C. FOX III
Title:
PROCESS FOR CREATING AN ETCH MASK SUITABLE FOR DEEP PLASMA ETCHES EMPLOYING SELF-ALIGNED SILICIDATION OF A METAL LAYER MASKED WITH A SILICON DIOXIDE TEMPLATE
Assignment: 1
Reel/Frame:
005394/0454Recorded: 07/19/1990Pages: 5
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST.
Assignor:
Exec Dt:
07/19/1990
Assignee:
2805 E. COLUMBIA ROAD
A CORP OF DE
BOISE, IDAHO 83706
Correspondent:
ANGUS C. FOX, III
PATENT COUNSEL, MICRON TECHNOLOGY, INC.,
2805 EAST COLUMBIA ROAD
BOISE, ID 83706

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