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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
03/22/1994
Application #:
07889202
Filing Dt:
05/27/1992
Inventors:
CHESTER SZWEJKOWSKI, IAN S. LATCHFORD, ISAMU NAMOSE, KAZUMI TSUCHIDA
Title:
PROCESS FOR REMOVAL OF RESIDUES REMAINING AFTER ETCHING POLYSILICON LAYER IN FORMATION OF INTEGRATED CIRCUIT STRUCTURE
Assignment: 1
Reel/Frame:
006154/0407Recorded: 05/27/1992Pages: 7
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST.
Assignors:
Exec Dt:
05/22/1992
Exec Dt:
05/26/1992
Exec Dt:
05/12/1992
Exec Dt:
05/18/1992
Assignees:
14-3 SHINIZUMI, NARITA-SHI
CHIBA-KEN 286, JAPAN
3-5, OWA 3-CHOME, SUWA-SHI
NAGANO-KEN, 392, JAPAN
Correspondent:
ROBERT J. STERN
LEGAL AFFAIRS DEPT. - M/S 0934
APPLIED MATERIALS, INC.
3050 BOWERS AVENUE
SANTA CLARA, CA 95054

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