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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
Issue Dt:
10/02/2001
Application #:
09677068
Filing Dt:
09/29/2000
Inventors:
Jyu-Horng Shieh, Jen-Cheng Liu, Chao-Cheng Chen, Li-Chih Chao, Chia-Shia Tsai
Title:
Edge defect inhibited trench etch plasma etch method
Assignment: 1
Reel/Frame:
011165/0765Recorded: 09/29/2000Pages: 4
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
Assignors:
Exec Dt:
08/10/2000
Exec Dt:
08/10/2000
Exec Dt:
08/10/2000
Exec Dt:
08/10/2000
Exec Dt:
08/10/2000
Assignee:
SCIENCE-BASED INDUSTRIAL PARK
NO. 121 PARK AVENUE III
HSIN-CHU, TAIWAN R.O.C
Correspondent:
TUNG & ASSOCIATES
RANDY W. TUNG
838 W. LONG LAKE ROAD
SUITE 120
BLOOMFIELD HILLS, MI 48302

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