Patent Assignment Abstract of Title
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Total Assignments:
1
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Patent #:
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Issue Dt:
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10/09/2001
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Application #:
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09523992
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Filing Dt:
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03/13/2000
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Inventors:
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Kai Shao, Jiong Zhang, Qing Hua Zhang, Yi Min Wang, Sanford Shao Fu Chu
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Title:
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Method to form a high K dielectric gate insulator layer, a metal gate structure, and self-aligned channel regions, post source/drain formation
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Assignment:
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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STREET 2 |
60 WOODLANDS INDUSTRIAL PARK D |
SINGAPORE 738406, SINGAPORE |
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GEORGE O. SAILE |
20 MCINTOSH DRIVE |
POUGHKEEPSIE, NY 12603 |
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